Advances in Thin Film Fabrication by Magnetron Sputtering

Rafal Chodun‬

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Hardback

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English

Mdpi AG
15 March 2024

Chemistry

Summary
Details

Magnetron sputtering technology is one of the most popular PVD methods used in the industry. Its importance is predicted to increase due to the current developments in research centers engaged in that particular domain. Developments are due to the modifications introduced into the sputtering technology itself (e.g., the use of innovative plasma sources, innovative technical means for influencing the state of the magnetron plasma, innovative approaches to the plasma's state and its control) and the production of new coating materials with functional properties that enable them to meet the needs of the modern industry. This reprint aims to present a collection of ideas describing recent advances in thin-film manufacturing technology, focusing on the influence of magnetron sputtering modification on the film synthesis conditions, parameters, and properties of the films that are produced.

Guest editor: Rafal Chodun‬
Imprint: Mdpi AG
Dimensions: Height: 244mm, Width: 170mm, Spine: 16mm
Weight: 608g
ISBN: 9783725806072
ISBN 10: 3725806071
Pages: 188
Publication Date: 15 March 2024
Audience: General/trade , ELT Advanced
Format: Hardback
Publisher's Status: Active