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Teach Yourself the Basics of Aspen Plus

Ralph Schefflan

$157.95

Paperback

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English
Wiley-AIChE
16 September 2016
The complete step-by-step guide to mastering the basics of Aspen Plus software

Used for a wide variety of important scientific tasks, Aspen Plus software is a modeling tool used for conceptual design, optimization, and performance monitoring of chemical processes. After more than twenty years, it remains one of the most popular and powerful chemical engineering programs used both industrially and academically.

Teach Yourself the Basics of Aspen Plus, Second Edition continues to deliver important fundamentals on using Aspen Plus software. The new edition focuses on the newest version of Aspen Plus and covers the newest functionalities. Lecture-style chapters set the tone for maximizing the learning experience by presenting material in a manner that emulates an actual workshop classroom environment. Important points are emphasized through encouragement of hands-on learning techniques that direct learners toward achievement in creating effective designs fluidly and with confidence. Teach Yourself the Basics of Aspen Plus, Second Edition includes:

Examples embedded within the text to focus the reader on specific aspects of the material being covered Workshops at the end of each chapter that provide opportunities to test the reader's knowledge in that chapter's subject matter Functionalities covered in the newest version of Aspen including the solution of a flowsheet by an equation oriented, EO approach, and the solution of problems which involve electrolyte equilibria Aspen Plus executable format as well as .txt format files containing details of the examples and the workshops as well as their solutions are provided as a download

Designed with both students and professionals in mind, Teach Yourself the Basics of Aspen Plus, Second Edition is like having a personal professor 24/7. Its revolutionary format is an exciting way to learn how to operate this highly sophisticated software—and a surefire way for readers to get the results they expect.

By:  
Imprint:   Wiley-AIChE
Country of Publication:   United States
Edition:   2nd edition
Dimensions:   Height: 254mm,  Width: 178mm,  Spine: 15mm
Weight:   522g
ISBN:   9781118980590
ISBN 10:   111898059X
Pages:   280
Publication Date:  
Audience:   Professional and scholarly ,  Undergraduate
Format:   Paperback
Publisher's Status:   Active

Ralph Schefflan has been an adjunct professor at Stevens Institute of Technology for the past thirty-five years. He has taught four graduate courses, thermodynamics, process simulation, numerical methods, and equilibrium stage operations during his time there as well as being SIT's representative to Aspen Technology. Dr. Schefflan introduced process simulation at SIT evolving from Flowtran to Aspen Plus and taught it for thirty years.

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