Optical Lithography for Advanced Semiconductor Patterning

Peter De Bisschop

$337

Hardback

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English

SPIE Press
31 May 2025

Light (optics); Applied optics

Series: Press Monographs

Summary
Details

Optical lithography is one of the key technologies in the fabrication of microchips. This book gives an account of modern lithography during the first half of the 2020s, when high-NA extreme-ultraviolet lithography (EUVL) was being introduced. Central to the book is a comprehensive description of the effects that impact the quality of the optical image inside the resist layer, a story that has become more complicated with every new lithography tool generation. This discussion builds gradually so that anyone with a graduate-type background in physics, chemistry, or mathematics can follow it from the start to the many subtleties of image formation in high-NA EUVL. It uses mathematics when useful and is accompanied by examples and case studies, many of which were created specifically for this book. This book will be of value for people who are new to lithography as well as for the more experienced lithographer.

By: Peter De Bisschop
Imprint: SPIE Press
Country of Publication: United States [Currently unable to ship to USA: see Shipping Info]
ISBN: 9781510680333
ISBN 10: 1510680330
Series: Press Monographs
Pages: 1156
Publication Date: 31 May 2025
Audience: Professional and scholarly , Undergraduate
Format: Hardback
Publisher's Status: Active

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Optical Lithography for Advanced Semiconductor Patterning

Peter De Bisschop

$337

Hardback

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