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Introduction to Focused Ion Beam Nanometrology

David C. Cox

$260.95   $208.50

Paperback

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English
Morgan & Claypool Publishers
30 October 2015
This book describes modern focused ion beam microscopes and techniques and how they can be used to aid materials metrology and as tools for the fabrication of devices that in turn are used in many other aspects of fundamental metrology. Beginning with a description of the currently available instruments including the new addition to the field of plasma-based sources, it then gives an overview of ion solid interactions and how the different types of instrument can be applied. Chapters then describe how these machines can be applied to the field of materials science and device fabrication giving examples of recent and current activity in both these areas.

By:  
Imprint:   Morgan & Claypool Publishers
Country of Publication:   United States
Dimensions:   Height: 254mm,  Width: 178mm,  Spine: 4mm
Weight:   333g
ISBN:   9781681740201
ISBN 10:   1681740206
Series:   IOP Concise Physics
Pages:   104
Publication Date:  
Audience:   General/trade ,  ELT Advanced
Format:   Paperback
Publisher's Status:   Active
1. Metrology 2. Focused Ion Beam 3. Ion-Solid Interactions 4. Focused Ion Beam - Materials Science Applications 5. Focused Ion Beam Fabrication for Metrology 6. Future Developments

David C. Cox received his PhD from the department of Metallurgy and Materials Science University of Cambridge, UK in 2001. He is currently a senior research fellow at the Advanced Technology Institute, University of Surrey, UK and has been seconded to the National Physical Laboratory, UK as a senior research scientist since 2005. Having a broad background in industry and academia covering many aspects of materials science, physics and electronic engineering, he has published close to 100 articles at the time of writing. Largely associated with both the Quantum Metrology and Materials groups at NPL, his most recent research work has concentrated on the area of using focused ion beam to fabricate devices for quantum metrology. Additionally, he has developed a strong interest in wider aspects of FIB fabrication and fundamental understanding of how focused ion beam can be used to study materials and the errors associated with aspects of the technique.

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