Ferroelectricity in Doped Hafnium Oxide

Edited by:   Uwe Schroeder (Deputy Scientific Director Nanoelectronic Materials Laboratory NaMLab Dresden Germany), Cheol Seong Hwang (Professor, Department of Materials Science and Engineering, Hybrid Materials, Seoul National University, Korea), Hiroshi Funakubo (Professor, Tokyo Institute of Technology, Japan)
Imprint:   Woodhead Publishing
Country of Publication:   United States [Currently unable to ship to USA: see Shipping Info]
Edition:   2nd edition
Dimensions:   Height: 229mm,  Width: 152mm, 
Weight:   1.000kg
ISBN:   9780443291821
ISBN 10:   0443291829
Series:   Woodhead Publishing Series in Electronic and Optical Materials
Pages:   794
Publication Date:   01 August 2025
Audience:   Professional and scholarly ,  College/higher education ,  Undergraduate ,  Further / Higher Education
Format:   Paperback
Publisher's Status:   Active

Uwe Schroeder has been Deputy Scientific Director at NaMLab in Dresden, Germany, since 2009. His primary research focuses include material properties of ferroelectric hafnium oxide and the integration of the material into future devices. As a project manager, he researched high-k dielectrics and their integration into DRAM capacitors, and it was during this work that the previously unknown ferroelectric properties of doped HfO2-based dielectrics were discovered. He has focused on a detailed understanding of these new material properties and their integration into memory devices ever since. Cheol Seong Hwang has been a Professor in the Department of Materials Science and Engineering at Seoul National University, Korea, since 1998. He is a recipient of the Alexander von Humboldt fellowship award, the 7th Presidential Young Scientist Award of the Korean government, and AP Faculty Excellence Award, Air Products, USA. His interests include high-k gate oxide, DRAM capacitors, new memory devices including RRAM/PRAM, ferroelectric materials and devices, and thin-film transistors. Hiroshi Funakubo is a Professor of the Department of Materials Science and Engineering, Tokyo Institute of Technology, Tokyo, Japan. He received the Richard M. Fulrath Award from the American Ceramic Society in 2008. His specific areas of interest include the preparation and properties of dielectric, ferroelectric, and piezoelectric films.