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CMOS Plasma and Process Damage by Kirk Prall at Abbey's Bookshop,
CMOS Plasma and Process Damage
— —
Kirk Prall

CMOS Plasma and Process Damage

Kirk Prall

$326.95   $261.21

Hardback

Not in-store but you can order this
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English
Springer International Publishing AG
17 May 2025
Condensed matter physics (liquid state & solid state physics); Circuits & components; Embedded systems
This book discusses the complex technology of building CMOS computer chips and covers some of the unusual problems that can occur during chip manufacturing. Readers will learn how plasma and process damage results from the high-energy processes that are used in chip manufacturing, causing harm to the chips, functional failure and reliability problems. 
By:  
Imprint:   Springer International Publishing AG
Country of Publication:   Switzerland
Dimensions:   Height: 235mm,  Width: 155mm, 
ISBN:   9783031890284
ISBN 10:   3031890280
Pages:   466
Publication Date:  
Audience:   Professional and scholarly ,  Undergraduate
Format:   Hardback
Publisher's Status:   Active

Kirk D. Prall (M'82) was born in 1958. He received the Ph.D. degree in electrical engineering from the University of New Mexico, Albuquerque, in 1990. He worked for Philips Semiconductors from 1982 to 1991, in the areas of EPROM, ROM, microprocessors. He joined Micron, Inc., Boise, ID, in 1991 working on DRAM, NOR, NAND, and emerging memories. He retired from Micron in 2019 and is currently writing engineering books. He has published several papers and holds more than 200 patents.

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